The Effects of AsH
3
Preflow Conditions at Low Temperature on the Morphology of GaAs Buffer Layers for GaAs/Si Grown by Metalorganic Chemical Vapor Deposition
Asai, Koyu; Fujita, Kazuhisa; Shiba, Yasunari
- 期刊名称Japanese Journal of Applied Physics
- 作者Asai, Koyu; Fujita, Kazuhisa; Shiba, Yasunari
- 卷第30卷
- 印刷ISSN0021-4922
- 文件大小1639.42KB
- 发表时间1991-11-15
- DOI10.1143/jjap.30.l1967