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Influence of manufacturing process of indium tin oxide sputtering targets on sputtering behavior

Influence of manufacturing process of indium tin oxide sputtering targets on sputtering behavior

B.L. Gehman; S. Jonsson; T. Rudolph; M. Scherer; M. Weigert; R. Werner
  • 作者B.L. Gehman; S. Jonsson; T. Rudolph; M. Scherer; M. Weigert; R. Werner
  • 卷第220卷
  • 印刷ISSN0040-6090
  • 文件大小419.25KB
  • 发表时间1992
  • DOI10.1016/0040-6090(92)90594-2
  • 页码333-336
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