Microscopic uniformity in plasma etching
- 期刊名称Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- 作者Gottscho, Richard A.
- 卷第10卷
- 期第5期
- 印刷ISSN0734-211X
- 文件大小2137.80KB
- 发表时间1992-9
- DOI10.1116/1.586180
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