Crystallization-induced stress in silicon thin films
- 期刊名称Applied Physics Letters
- 作者Miura, Hideo; Ohta, Hiroyuki; Okamoto, Noriaki; Kaga, Toru
- 卷第60卷
- 期第22期
- 印刷ISSN0003-6951
- 文件大小636.98KB
- 发表时间1992
- DOI10.1063/1.106864
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