Contactless characterization of the Si+ ion-implanted semi-insulating GaAs
Ito, Akira; Usami, Akira; Wada, Takao
- 期刊名称Journal of Applied Physics
- 作者Ito, Akira; Usami, Akira; Wada, Takao
- 卷第71卷
- 期第8期
- 印刷ISSN0021-8979
- 文件大小546.40KB
- 发表时间1992
- DOI10.1063/1.350836