A kinetic model for silicide formation through thin-film metal-silicon reactions
- 期刊名称Journal of Applied Physics
- 作者Zhang, Lin; Ivey, Douglas G.
- 卷第71卷
- 期第9期
- 印刷ISSN0021-8979
- 文件大小1978.93KB
- 发表时间1992
- DOI10.1063/1.350813
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