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A Transmission Electron Microscopy Study of Process-Induced Defects in Submicron SOI Structures

A Transmission Electron Microscopy Study of Process-Induced Defects in Submicron SOI Structures

Theodore, N. David
  • 期刊名称Journal of The Electrochemical Society
  • 作者Theodore, N. David
  • 卷第139卷
  • 期第1期
  • 印刷ISSN0013-4651
  • 文件大小1961.59KB
  • 发表时间1992
  • DOI10.1149/1.2069188
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