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Orientation Control of AlN Film by Electron Cyclotron Resonance Ion Beam Sputtering

Orientation Control of AlN Film by Electron Cyclotron Resonance Ion Beam Sputtering

H. Okano; T. Tanaka; K. Shibata; S. Nakano

作者H. Okano; T. Tanaka; K. Shibata; S. Nakano
文件大小1556.66KB
发表时间1992
DOI10.1143/JJAP.31.3017

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