Two-dimensional hybrid model of inductively coupled plasma sources for etching

• 期刊名称Applied Physics Letters
• 作者Ventzek, Peter L. G.; Sommerer, Timothy J.; Hoekstra, Robert J.; Kushner, Mark J.
• 卷第63卷
• 期第5期
• 印刷ISSN0003-6951
• 文件大小610.72KB
• 发表时间1993
• DOI10.1063/1.109963