The baroclinic flow instability in rotating silicon melt
- 期刊名称Journal of Crystal Growth
- 作者Watanabe, Masahito; Eguchi, Minoru; Kakimoto, Koichi; Baros, Yann; Hibiya, Taketoshi
- 卷第128卷
- 印刷ISSN0022-0248
- 文件大小306.55KB
- 发表时间1993-03
- DOI10.1016/0022-0248(93)90335-t
- 页码288-292
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