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On-line detection and monitoring of plasma etch damage to semi-insulating GaAs

On-line detection and monitoring of plasma etch damage to semi-insulating GaAs

P.A.F. Herbert; M. Murtagh; P.V. Kelly; G.M. Crean; W.M. Kelly
  • 作者P.A.F. Herbert; M. Murtagh; P.V. Kelly; G.M. Crean; W.M. Kelly
  • 卷第21卷
  • 印刷ISSN0167-9317
  • 文件大小456.71KB
  • 发表时间1993
  • DOI10.1016/0167-9317(93)90081-f
  • 页码315-320
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