发现好书期刊,享受阅读乐趣

海量图书期刊资源,随时随地畅享阅读乐趣

High permeability of Fe–Al–Si alloys films deposited on plasma-free substrate by dc bias sputtering

High permeability of Fe–Al–Si alloys films deposited on plasma-free substrate by dc bias sputtering

Hirata, Toyoaki; Naoe, Masahiko
  • 期刊名称Journal of Applied Physics
  • 作者Hirata, Toyoaki; Naoe, Masahiko
  • 卷第73卷
  • 期第10期
  • 印刷ISSN0021-8979
  • 文件大小567.95KB
  • 发表时间1993
  • DOI10.1063/1.352572
← 返回【学霸图书馆】主页