Ultrahigh Purity Liquid Phase Epitaxial Growth of GaAs
- 期刊名称Japanese Journal of Applied Physics
- 作者Amano, Toshimasa; Kondo, Susumu; Nagai, Haruo; Maruyama, Susumu
- 卷第32卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小1059.09KB
- 发表时间1993-9-15
- DOI10.1143/jjap.32.3692
- 页码3692-3699
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