BaTiO 3 Films for Silicon-on-Insulator Structure
- 期刊名称Japanese Journal of Applied Physics
- 作者Yamanashi, Akira; Tanaka, Keiichi; Nagatomo, Takao; Omoto, Osamu
- 卷第32卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小488.08KB
- 发表时间1993-9-30
- DOI10.1143/JJAP.32.4179
- 页码4179-4181
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