Electron Beam Block Exposure System for 256 M Dynamic Random Access Memory Lithography

Sakamoto, Kiichi; Fueki, Shunsuke; Yamazaki, Satoru; Abe, Tomohiko; Kobayashi, Katsuhiko; Nishino, Hisayasu; Satoh, Takamasa; Takemoto, Akio; Ookura, Akio; Ohno, Manabu; Sagoh, Satoru; Oae, Yoshihisa; Yamada, Akio; Kai, Junichi; Yasuda, Hiroshi

期刊名称Japanese Journal of Applied Physics
作者Sakamoto, Kiichi; Fueki, Shunsuke; Yamazaki, Satoru; Abe, Tomohiko; Kobayashi, Katsuhiko; Nishino, Hisayasu; Satoh, Takamasa; Takemoto, Akio; Ookura, Akio; Ohno, Manabu; Sagoh, Satoru; Oae, Yoshihisa; Yamada, Akio; Kai, Junichi; Yasuda, Hiroshi
卷第32卷
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小2089.57KB
发表时间1993-12-30
DOI10.1143/JJAP.32.6006
页码6006-6011

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Electron Beam Block Exposure System for 256 M Dynamic Random Access Memory Lithography