Crystallization in fluorinated and hydrogenated amorphous silicon thin films
- 期刊名称Journal of Applied Physics
- 作者Edelman, F.; Cytermann, C.; Brener, R.; Eizenberg, M.; Khait, Yu. L.; Weil, R.; Beyer, W.
- 卷第75卷
- 期第12期
- 印刷ISSN0021-8979
- 文件大小938.90KB
- 发表时间1994
- DOI10.1063/1.356572
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