The 248 nm Excimer Laser Ablation of Liquid Benzene Derivatives: A Relation between Ablation Threshold and Molecular Photochemical Reactivity
- 期刊名称The Journal of Physical Chemistry
- 作者Tsuboi, Yasuyuki; Hatanaka, Koji; Fukumura, Hiroshi; Masuhara, Hiroshi
- 卷第98卷
- 期第44期
- 印刷ISSN0022-3654
- 电子ISSN1541-5740
- 文件大小973.73KB
- 发表时间1994-11
- DOI10.1021/j100095a001
- 页码11237-11241
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