Simulation of various diffusion processes in implanted silicon
- 期刊名称Radiation Effects and Defects in Solids
- 作者Antoncik, E.
- 卷第129卷
- 印刷ISSN1042-0150
- 电子ISSN1029-4953
- 文件大小653.00KB
- 发表时间1994-06
- DOI10.1080/10420159408229030
- 页码301-313
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