发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

The Physicochemical Properties and Growth Mechanism of Oxide (SiO[sub 2−x]F[sub x]) by Liquid Phase Deposition with H[sub 2]O Addition Only

The Physicochemical Properties and Growth Mechanism of Oxide (SiO[sub 2−x]F[sub x]) by Liquid Phase Deposition with H[sub 2]O Addition Only

Yeh, Ching-Fa

期刊名称Journal of The Electrochemical Society
作者Yeh, Ching-Fa
卷第141卷
期第11期
印刷ISSN0013-4651
文件大小474.42KB
发表时间1994
DOI10.1149/1.2059298

← 返回【学霸图书馆】主页