Effects of Hydrogen and Bias on Single-Crystal Al Growth on Vicinal Si by DC Magnetron Sputtering
- 期刊名称Japanese Journal of Applied Physics
- 作者Yokoyama, Shin; Ichikawa, Hiroshi; Ichikawa, Yoshiyuki; Koyanagi, Mitsumasa
- 卷第33卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小808.88KB
- 发表时间1994-1-30
- DOI10.1143/JJAP.33.459
- 页码459-461
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