193 nm resists and lithography
- 作者Roderick R. Kunz; Robert D. Allen; Mark A. Hartney; William D. Hinsberg; Mark W. Horn; Craig L. Keast; Mordechai Rothschild; David C. Shaver; Gregory M. Wallraff
- 卷第5卷
- 期第1期
- 印刷ISSN1042-7147
- 电子ISSN1099-1581
- 文件大小2405.24KB
- 发表时间1994
- DOI10.1002/pat.1994.220050103
- 页码12-21
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