Ablation of Si-containing Polymers: Application to X-ray Lithography.

• 期刊名称Journal of Photopolymer Science and Technology
• 作者Yamaguchi, Atsuko; Ogawa, Taro; Soga, Takashi; Tachibana, Hiroaki; Matsumoto, Mutsuyoshi; Oizumi, Hiroaki; Takeda, Eiji
• 卷第7卷
• 期第3期
• 印刷ISSN0914-9244
• 电子ISSN1349-6336
• 文件大小418.56KB
• 发表时间1994
• DOI10.2494/photopolymer.7.607
• 页码607-614