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Projection-patterned etching of silicon in chlorine atmosphere with a KrF excimer laser

Projection-patterned etching of silicon in chlorine atmosphere with a KrF excimer laser

F. Foulon, M. Green

作者F. Foulon, M. Green
卷第61卷
期第6期
文件大小1125.81KB
发表时间1995-12
DOI10.1007/BF01542879
页码655-661

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