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Relation between degradation and breakdown of thin SiO2 films under AC stress conditions

Relation between degradation and breakdown of thin SiO2 films under AC stress conditions

M. Nafría; D. Yélamos; J. Suñé; X. Aymerich

作者M. Nafría; D. Yélamos; J. Suñé; X. Aymerich
卷第28卷
印刷ISSN0167-9317
文件大小340.74KB
发表时间1995
DOI10.1016/0167-9317(95)00067-i
页码321-324

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