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Microstructure of copper films condensed from a copper plasma with ion energies between 2 and 150 eV

Microstructure of copper films condensed from a copper plasma with ion energies between 2 and 150 eV

Michael Mausbach

作者Michael Mausbach
印刷ISSN0257-8972
文件大小859.29KB
发表时间1995
DOI10.1016/0257-8972(94)08204-9
页码264-272

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