Excimer laser cleaning of Si(100) surfaces at 193 and 248 nm studied by LEED, AES and XPS spectroscopies
- 作者R. Larciprete; E. Borsella
- 卷第76卷
- 印刷ISSN0368-2048
- 文件大小517.44KB
- 发表时间1995
- DOI10.1016/0368-2048(95)02448-4
- 页码607-612
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