Effect of rapid thermal annealing on the structural and electrical properties of a silicon-silicon oxide system
- 期刊名称Journal of Applied Physics
- 作者Choi, W. K.; Chan, Y. M.; Ah, L. K.; Loh, F. C.; Tan, K. L.; Ramam, A.
- 卷第78卷
- 期第7期
- 印刷ISSN0021-8979
- 文件大小906.37KB
- 发表时间1995
- DOI10.1063/1.359844
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