[IEEE International Conference on Plasma Science (papers in summary form only received) - Madison, WI, USA (1995.06.5-1995.06.8)] International Conference on Plasma Science (papers in summary form only received) - Comprehensive modeling of plasma source ion implantation
- 作者Kissick, M.W.; Blanchard, J.P.; Callen, J.D.; Conrad, J.R.; Malik, S.; Sridharan, K.
- 文件大小77.69KB
- 发表时间1995
- DOI10.1109/plasma.1995.531729
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