Negative Tone Dry Development of Si-Containing Resists by Laser Ablation
- 期刊名称Japanese Journal of Applied Physics
- 作者Yamaguchi, Atsuko; Tachibana, Hiroaki; Oizumi, Hiroaki; Soga, Takashi; Tanaka, Toshihiko; Ogawa, Taro; Matsumoto, Mutsuyoshi; Takeda, Eiji
- 卷第34卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小436.67KB
- 发表时间1995-12-30
- DOI10.1143/JJAP.34.6800
- 页码6800-6804
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