Coulomb Interaction Effect in Cell Projection Lithography
- 期刊名称Japanese Journal of Applied Physics
- 作者Yamashita, Hiroshi; Tamura, Takao; Nomura, Eiichi; Hiroshi Nozue, Hiroshi Nozue
- 卷第34卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小828.74KB
- 发表时间1995-12-01
- DOI10.7567/JJAP.34.6684
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