Atomic Layer Etching of Silicon by Thermal Desorption Method
- 期刊名称Japanese Journal of Applied Physics
- 作者Imai, Shigeru; Haga, Takeo; Matsuzaki, Osamu; Hattori, Takeo; Matsumura, Masakiyo
- 卷第34卷
- 印刷ISSN0021-4922
- 文件大小204.43KB
- 发表时间1995-9-15
- DOI10.1143/JJAP.34.5049
- 页码5049-5053
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