Fabrication of Novel Si Double-Barrier Structures and Their Characteristics
- 期刊名称Japanese Journal of Applied Physics
- 作者Yuki, Koichiro; Hirai, Yoshihiko; Morimoto, Kiyoshi; Inoue, Kaoru; Niwa, Masaaki; Yasui, Juro
- 卷第34卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小887.52KB
- 发表时间1995-2-28
- DOI10.1143/JJAP.34.860
- 页码860-863
Spectral Emissivity of SiliconSatō, Tsutomu · Japanese Journal of Applied Physics · 1967
Surface Acoustic Wave SensorsShiokawa, Showko; Kondoh, Jun · Japanese Journal of Applied Physics · 2004
Perspectives in SonochemistryAndo, Takashi; Kimura, Takahide · Japanese Journal of Applied Physics · 2003
Structurally Stable Hyperbolic BeamChakraborty, Rijuparna; Ghosh, Ajay · Japanese Journal of Applied Physics · 2009
Peierls Phase TransitionKagoshima, Seiichi · Japanese Journal of Applied Physics · 1981
Piezoelectric Tensor of KNbO <sub/>3</sub>Günter, P. · Japanese Journal of Applied Physics · 1977
Plasma Anodic Oxidation of InPFuyuki, Takashi; Moriuchi, Sohta; Matsunami, Hiroyuki · Japanese Journal of Applied Physics · 1983
Linearity Characteristics of Multiplier PhototubesNonaka, Mamoru; Kashima, Takeo · Japanese Journal of Applied Physics · 1963