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SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>Resist charging in electron-beam lithography</title>

SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - Resist charging in electron-beam lithography

Liu, Weidong; Pease, Roger Fabian W.; Shelden, Gilbert V.; Wiley, James N.

作者Liu, Weidong; Pease, Roger Fabian W.; Shelden, Gilbert V.; Wiley, James N.
卷第2621卷
印刷ISSN0277-786X
文件大小287.50KB
发表时间1995
DOI10.1117/12.228205
页码516-526

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