SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - 24"x 20" precision photomasks manufacture
- 作者Guel, Graciela R.; Boothman, Martin; Rector, Daniel R.; Wilson, Susan M.; Shelden, Gilbert V.; Wiley, James N.
- 卷第2621卷
- 印刷ISSN0277-786X
- 文件大小270.98KB
- 发表时间1995
- DOI10.1117/12.228177
- 页码256-263
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