KRS: An Environmentally Robutst Resist Based on Fast Reaction kinetics.
Huang, Wu-Song; Katnani, Ahmad D.; Yang, Dominic; Brunsvold, Bill; Bantu, Rao; Khojasteh, Mahmoud; Sooriyakumaran, R.; Kwong, Ranee; Lee, Kim Y.; Hefferon, George; Orsula, George; Cameron, Jim; Denison, Mark; Sinta, Roger; Thackeray, Jim
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Huang, Wu-Song; Katnani, Ahmad D.; Yang, Dominic; Brunsvold, Bill; Bantu, Rao; Khojasteh, Mahmoud; Sooriyakumaran, R.; Kwong, Ranee; Lee, Kim Y.; Hefferon, George; Orsula, George; Cameron, Jim; Denison, Mark; Sinta, Roger; Thackeray, Jim
- 卷第8卷
- 期第4期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小522.10KB
- 发表时间1995
- DOI10.2494/photopolymer.8.525
- 页码525-534