[Widerkehr & Associates 1996 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (11-13 June 1996)] 1996 Symposium on VLSI Technology. Digest of Technical Papers - A Ti salicide process for 0.10 μm gate length CMOS technology

• 作者Kittl, J.A.; Qi-Zhong Hong, ; Redder, M.; Prinslow, D.A.; Misium, G.R.
• 文件大小280.57KB
• 发表时间1996
• DOI10.1109/vlsit.1996.507775
• 页码14-15