Si thin films prepared by molecular-beam epitaxy
- 期刊名称Physical Review B
- 作者Mahan, John E.; Vantomme, André; Langouche, Guido; Becker, James P.
- 卷第54卷
- 期第23期
- 印刷ISSN0163-1829
- 电子ISSN1095-3795
- 文件大小232.17KB
- 发表时间1996-12-15
- DOI10.1103/PhysRevB.54.16965
- 页码16965-16971
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