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Growth Temperature Window and Self-Limiting Process in Sub-Atomic-Layer Epitaxy

Growth Temperature Window and Self-Limiting Process in Sub-Atomic-Layer Epitaxy

Ishida, Masahiro; Yamashita, Mitsutomi; Nagata, Yoshio; Suda, Yoshiyuki

期刊名称Japanese Journal of Applied Physics
作者Ishida, Masahiro; Yamashita, Mitsutomi; Nagata, Yoshio; Suda, Yoshiyuki
卷第35卷
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小932.15KB
发表时间1996-7-15
DOI10.1143/jjap.35.4011
页码4011-4015

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