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Seventy-nm-Pitch Patterning on CaF
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by e-beam Exposure

Seventy-nm-Pitch Patterning on CaF ₂ by e-beam Exposure

Hongo, Hiroo; Hattori, Tetsuya; Miyamoto, Yasuyuki; Furuya, Kazuhito; Matsunuma, Takeshi; Watanabe, Masahiro; Asada, Masahiro

期刊名称Japanese Journal of Applied Physics
作者Hongo, Hiroo; Hattori, Tetsuya; Miyamoto, Yasuyuki; Furuya, Kazuhito; Matsunuma, Takeshi; Watanabe, Masahiro; Asada, Masahiro
卷第35卷
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小767.39KB
发表时间1996-12-15
DOI10.1143/JJAP.35.6342
页码6342-6343

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