Raman Spectroscopy of Ion-Implanted Silicon
- 期刊名称MRS Proceedings
- 作者Tuschel, David D.; Lavine, James P.
- 卷第439卷
- 电子ISSN1946-4274
- 文件大小296.34KB
- 发表时间1996-1
- DOI10.1557/proc-439-47
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