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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - <title>Multiparameter CD measurements using scatterometry</title>

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Multiparameter CD measurements using scatterometry

Raymond, Christopher J.; Murnane, Michael R.; Prins, Steven L.; Naqvi, S. Sohail H.; McNeil, John R.; Hosch, Jimmy W.; Jones, Susan K.
  • 作者Raymond, Christopher J.; Murnane, Michael R.; Prins, Steven L.; Naqvi, S. Sohail H.; McNeil, John R.; Hosch, Jimmy W.; Jones, Susan K.
  • 卷第2725卷
  • 印刷ISSN0277-786X
  • 文件大小415.48KB
  • 发表时间1996
  • DOI10.1117/12.240121
  • 页码698-709
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