SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Multiparameter CD measurements using scatterometry
Raymond, Christopher J.; Murnane, Michael R.; Prins, Steven L.; Naqvi, S. Sohail H.; McNeil, John R.; Hosch, Jimmy W.; Jones, Susan K.
- 作者Raymond, Christopher J.; Murnane, Michael R.; Prins, Steven L.; Naqvi, S. Sohail H.; McNeil, John R.; Hosch, Jimmy W.; Jones, Susan K.
- 卷第2725卷
- 印刷ISSN0277-786X
- 文件大小415.48KB
- 发表时间1996
- DOI10.1117/12.240121
- 页码698-709