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[IEEE 1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings - Sinaia, Romania (9-12 Oct. 1996)] 1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings - LPCVD conditions generating an intense homogeneous decomposition of silane in the temperature range of 500-630°C

[IEEE 1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings - Sinaia, Romania (9-12 Oct. 1996)] 1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings - LPCVD conditions generating an intense homogeneous decomposition of silane in the temperature range of 500-630°C

Cobianu, C.; Cosmin, P.; Plugaru, R.; Dascalu, D.; Holleman, J.
  • 作者Cobianu, C.; Cosmin, P.; Plugaru, R.; Dascalu, D.; Holleman, J.
  • 卷第1卷
  • 文件大小487.17KB
  • 发表时间1996
  • DOI10.1109/smicnd.1996.557355
  • 页码249-252
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