Real-Time Measurement of Thin Film Thickness During Plasma Processing

• 作者M. Sarfaty; C. Baum; R. Breun; N. Hershkowitz; J. L. Shohet; K. Nagpal; T. L. Vincent; P. P. Khargonekar
• 卷第2卷
• 期第4期
• 印刷ISSN1084-0184
• 电子ISSN1572-8978
• 文件大小964.20KB
• 发表时间1997-12
• DOI10.1023/a:1021830100153
• 页码229-244