Tantalum-gate thin-film SOI nMOS and pMOS for low-power applications
- 作者Shimada, H.; Hirano, Y.; Ushiki, T.; Ino, K.; Ohmi, T.
- 卷第44卷
- 期第11期
- 印刷ISSN0018-9383
- 电子ISSN1557-9646
- 文件大小131.77KB
- 发表时间1997
- DOI10.1109/16.641359
- 页码1903-1907
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