发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

Effect of H[sub 2] addition on surface reactions during CF[sub 4]/H[sub 2] plasma etching of silicon and silicon dioxide films

Effect of H[sub 2] addition on surface reactions during CF[sub 4]/H[sub 2] plasma etching of silicon and silicon dioxide films

Marra, Denise C.

期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
作者Marra, Denise C.
卷第15卷
期第5期
印刷ISSN0734-2101
文件大小520.37KB
发表时间1997-9
DOI10.1116/1.580762

← 返回【学霸图书馆】主页