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Electrical and structural characterization of PtSi/p-Si[sub 1−x]Ge[sub x] low Schottky barrier junctions prepared by co-sputtering

Electrical and structural characterization of PtSi/p-Si[sub 1−x]Ge[sub x] low Schottky barrier junctions prepared by co-sputtering

O. Nur
  • 作者O. Nur
  • 文件大小723.30KB
  • 发表时间1997
  • DOI10.1116/1.589272
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