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Heterogeneous Particle Formation during Low Pressure Etching of Silicon Dioxide

Heterogeneous Particle Formation during Low Pressure Etching of Silicon Dioxide

W. J. Yoo; B. Y. Nam; W. S. Kim; K. S. Shin; C. O. Jung; Y. B. Koh; M. Y. Lee

作者W. J. Yoo; B. Y. Nam; W. S. Kim; K. S. Shin; C. O. Jung; Y. B. Koh; M. Y. Lee
文件大小995.49KB
发表时间1997
DOI10.1143/JJAP.36.4971

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