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Early resistance change and stress/electromigration modeling in aluminum interconnects

Early resistance change and stress/electromigration modeling in aluminum interconnects

V. Petrescu; A.J. Mouthaan; W. Schoenmaker

作者V. Petrescu; A.J. Mouthaan; W. Schoenmaker
卷第37卷
印刷ISSN0026-2714
文件大小243.72KB
发表时间1997
DOI10.1016/s0026-2714(97)00093-0
页码1491-1494

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