Plasma etching and patterning of CVD diamond at <100°C for microelectronics applications

• 作者R. Ramesham; W. Welch; W.C. Neely; M.F. Rose; R.F. Askew
• 卷第304卷
• 印刷ISSN0040-6090
• 文件大小833.77KB
• 发表时间1997
• DOI10.1016/s0040-6090(97)00195-8
• 页码245-251