[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Fullerene ion (C/sub 60//sup +/) implantation in GaAs[100] substrate

• 作者Nishihara, T.; Katsumata, H.; Matsuo, J.; Yamada, I.
• 卷第2卷
• 文件大小316.24KB
• 发表时间1998
• DOI10.1109/iit.1998.813900
• 页码1203-1206